| MONOMER RELEASE FROM PIT AND FISSURE SEALANT FOLLOWING BY SURFACE TREATMENT AND CURING TIME |
| 강릉대학교 치과대학 소아치과학교실 |
| 치면열구전색제의 표면처리와 중합시간 증가에 따른 미반응 모노머 용리 평가 |
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서현우 |
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강릉대학교 치과대학 소아치과학교실 |
Correspondence:
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| Abstract |
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The purpose of this study was to evaluate the effects of a various light curing time on the residual monomers released from light-cured dental sealant, and to examine the effectiveness of surface treatment in reducing the oxygen-inhibited layer of light-cured dental sealant(Helioseal® F, Vivadent, Liechtenstein). Specimens were cured with a halogen light curing unit(XL 3000, 3M, USA) for 20, 40, 60s. Surface treatment of a light-cured dental sealant included no treatment(control group), a 10-seconds exposure to distilled water(Group I), 10-seconds manual application using a cotton pellet wetted with 75% alcohol(Group II), and 10-seconds application of a water/pumice slurry using a rubber cup on a slow-speed handpiece The specimens were eluted in distilled water for 10 minutes. All elutes were analyzed by HPLC for identification and quantitive analysis of monomers. The results of this study can be summarized as follows. 1. None of the chromatograms of the tested sealant displayed peaks with the same retention time as that of the standard solution, except for TEGDMA. 2. The release of TEGDMA decreased with increasing curing time in conventional halogen light. 3. All surface treatment group had a decrease of monomer release in comparison with no treatment group. 4. Treatment that Group III eliminated the greatest amount of any type of residual monomers. 5. The elution of unreacted monomers from curing with halogen curing unit for 60s and Group III was less than other groups. |
| Key Words:
Pit and fissure sealant, Curing time, Surface treatment, Monomer |
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